The laboratory is equipped with various micro-electronic processing equipment and characterization systems. Some of these are RF sputtering systems, electron beam and thermal evaporation systems, lapping and polishing machine, wire-bonding and dicing saw. Charaterization and measuremnt systems include digital and analog oscilloscopes, various spectrometers, optical monochromators. An ultra-high (10-11 Torr) and a moderate (10-6 Torr) vacuum systems, various measuring instrumentation and high power high voltage supplies are also available.

For microwave measuremnts, computer interfaced HP-8510C Vector Network Analyzer, noise figure meter, probing station, a spectrum analyzer and various other microwave instrumentation are also available. Ansof HFFS, HP-Libra® and MICAD®, microwave design software, an HP transistor test fixture with measurement and calibration software complement the microwave characterization and measurement capabilities.

A new compact range antenna characterizing facility has been set up to measure the radiation characteristics of antennas especially the patch antennas and active phased array antennas.

A scanning electron microscope (SEM), a Dektak II profilometer, an optical thickness measurement system, a Reactive Ion Etching (RIE) system complement the micro-electronic processing and charaterization equipment.
APD-204SL closed cycle refrigeration system, {17 W at 77 K (temperature range 10-350 K)} with special provisions for waveguide and coaxial connections is operational for low temperature research purposes.

A dedicated optical bench is set-up for opto-electronic research activity. The bench includes various precision micrometer positioners, infrared laser, a closed circuit television system and other optical component holders.

There are also basic milimeter wave equipment in the laboratory to make measurements at 94 GHz range.